YES-CV200RFS Plasma Photoresist Strip/descum
System for 2″ to 200 mm wafers
PLC control of valves, temperature set points, plasma generation power, auto operation, touch screen interface
RF Plasma Power: 40 kHz, 100-1000 W capacitive, downstream Wafer Platen temperature range from ambient to 250° C
Capacity: single wafer/pieces for 50mm – 200mm; Dual wafer/pieces for two 100mm Mass Flow Controllers
Real Time data collection of all process control data